Si—Al—Zr—O系非晶原位晶化过程中的拉曼光谱和红外光谱研究

doi:10.3964/j.issn.1000-0593(2011)01-0123-04

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Abstract The structural changes in the in-situ controlled crystallizing process of Si—Al—Zr—O(SAZ) amorphous bulk were investigated by laser Raman (LRa), infrared (IR) and X-ray diffraction (XRD) techniques. The structure of the amorphous network apparently reorganized at about 920 ℃, resulting in the formation of Si-rich and Al, Zr-rich regions. The t-ZrO₂ was crystallized from the Zr-rich region at 920~950 ℃ and poorly defined Al—Si spinel was formed from the Al-rich regions. With the increase in temperature, the peak of Al—Si spinel was enhanced and then disappeared in the XRD pattern, and the characteristic IR band groups of mullite centered in the 1 200~1 100, 1 000~700 and 650~400 cm^-1 could be observed. At 1 100~1 150 ℃, the Raman bands at 179 and 193 cm^-1 typical for the m-ZrO₂ occurred and cristobalite was detected, and the main crystalline phases were identified as t-ZrO₂ and mullite. These results indicated that mullite was formed by reaction between amorphous silica and the Al—Si spinel which was metastable phase. During the heating process, t-ZrO₂ was crystallized firstly and a portion was transformed to m-ZrO₂ at high temperature, and the left amorphous silica was transformed to cristobalite.

Key words：Si—Al—Zr—O amorphous bulk;IR;Raman;Microstructure changes

Received: 2010-03-18 Accepted: 2010-06-22

ZTFLH:

TQ171

Corresponding Authors: TAN Xiao-ping E-mail: tanxiaoping_hn@163.com

Cite this article:

TAN Xiao-ping,LIANG Shu-quan,CHAI Li-yuan, et al. Study of Raman and IR Spectra for Si—Al—Zr—O Amorphous Bulk In-Situ Crystallization [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2011, 31(01): 123-126.

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https://www.gpxygpfx.com/EN/10.3964/j.issn.1000-0593(2011)01-0123-04 OR https://www.gpxygpfx.com/EN/Y2011/V31/I01/123