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SPECTROSCOPY AND SPECTRAL ANALYSIS  2004, Vol. 24 Issue (05): 603-605
光谱学与光谱分析 |
Effect of Oxygen Partial Pressure on the Band-Gap of the TiO2 Films Prepared by DC Reactive Sputtering
ZHAO Qing-nan1, 2,LI Chun-ling1, 2,LIU Bao-shun1,ZHAO Xiu-jian1
1. The Key Laboratory of Silicate Materials Science and Engineering, Ministry of Education, Wuhan University of Technology,Wuhan 430070,China
2. Center for Materials Research and Analysis, Wuhan University of Technology,Wuhan 430070,China