远程Ar等离子的发射光谱研究

doi:10.3964/j.issn.1000-0593(2023)02-0394-07

Abstract
References
Related Citation (15)

Download: PDF (5196 KB)
Export: BibTeX | EndNote (RIS)

Abstract Remote plasma can effectively avoid the etching effect caused by electron-ion collision, improve the free radical reaction, and achieve a better modification effect. All of which have important applications in the field of membrane materials. In order to study the electron states and their variation laws in remote plasma, emission spectroscopy was used to diagnose the remote Ar plasma. Further, the effects of RF power, the pressure inside the reaction chamber, and distance from the discharge center on the emission spectral intensity, electron density, and electron temperature of the remote Ar plasma were also investigated. The results show that the characteristic peaks are more concentrated in the 690～890 nm region, which is dominated by ArⅠ atomic spectral lines, and that the variation pattern of the intensity of the spectral lines is the same as that of the electron density. The electron temperatures at different discharge parameters were calculated using the Boltzmann slope method and three selected ArⅠ spectral lines. The electron temperature changes with the change in the RF power, the pressure inside the reaction chamber, and the distance from the discharge center. When the RF power is increased from 30 to 150 W, the electronic temperature drops from 3 105.39 to 2 552.91 K. When the pressure rises from 15 to 25 Pa, the electron temperature drops from 3 066.53 to 2 593.32 K, then rises to 2 661.71 K when the pressure increases to 35 Pa. The electron temperature increases from 0 to 10 cm from the discharge center due to the increase in plasma potential, while after 10 cm, the electron temperature decreases and tends to 0 K at 80 cm from the discharge center. By analyzing the Stark spread of the Ar Ⅰ 696.894 spectral line, the electron density of the remote Ar plasma was calculated, and it was discovered that the electron density is up to 10¹⁶ cm^-3 in order of magnitude. When the RF power was increased from 30 to 150 W, the electron density increased from 2.15×10¹⁶ to 2.88×10¹⁶ cm^-3, from 2.36×10¹⁶ to 2.90×10¹⁶ cm^-3 when the pressure was increased from 15 to 25 Pa, and decreased to 1.89×10¹⁶ cm^-3 when the pressure was increased to 35 Pa. The electron density decreases rapidly as the axial distance increases, reaching 0 cm^-3 at 80 cm from the discharge center. The discharge parameters and axial distance can be adjusted to achieve a low concentration of electrons and ions in the atmosphere, thereby effectively avoiding the etching effect caused by electron-ion collision and achieving a better modification effect.

Key words：Remote plasma; Emission spectrum; Electronic temperature; Electron density

Received: 2021-12-14 Accepted: 2022-04-29

ZTFLH:

O536

Cite this article:

LI Ru,YANG Xin,XING Qian-yun, et al. Emission Spectroscopy Study of Remote Ar Plasma[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2023, 43(02): 394-400.

URL:

https://www.gpxygpfx.com/EN/10.3964/j.issn.1000-0593(2023)02-0394-07 OR https://www.gpxygpfx.com/EN/Y2023/V43/I02/394

[1] Liang C H，Li C，Chen T H. Polymer Degradation and Stability，2018，160：89.
[2] Li R，Zhang Y，Li Q. Surface Engineering，2021，37（9）：1110.
[3] Li R，Liang Y，Li Q. Vacuum，2020，175: 109276.
[4] Zhang S Z，Cheng C，Lan Y. Plasma Science & Technology，2009，11（5）：576.
[5] Younus M，Rehman N U，Shafiq M. Plasma Physics Reports，2017，43（5）：588.
[6] Tsumaki M，Ito T. AIP Advances，2017，7（12）: 125211.
[7] WU Shu-qun，DONG Xi，PEI Xue-kai（吴淑群，董熙，裴学凯）. Transactions of China Electrotechnical Society（电工技术学报），2017, 32（8）: 82.
[8] LIN Min，XU Hao-jun，WEI Xiao-long（林敏，徐浩军，魏小龙）. Acta Physica Sinica（物理学报），2015，64(5)：313.
[9] SUN Qin，TIAN Lei-chao，WU Yao-xing（孙秦，田雷超，武耀星）. Laser Technology（激光技术），2021，4（1）：109.
[10] Qayyum A，Zeb S，Naveed M A. Journal of Quantitative Spectroscopy & Radiative Transfer，2007，107(3): 361.
[11] ZHANG Jin，YUAN Zhao，CHEN Li-xue（张晋，袁召，陈立学）. HING Power Laser and Particle Beams（强激光与离子束），2021，33(6)：1.
[12] Yuan Q H，Ren P，Liu S S. Physics Letters A，2020，384（12）: 126367.
[13] Zhang H B，Yuan F L，Chen Q. IEEE Transactions on Plasma Science，2020，48（10）：3621.
[14] Zaplotnik R，Primc G，Vesel A. Applied Sciences-Basel，2021，11（5）: 2275.
[15] Mansuroglu D. AIP Advances，2019，9(5)：1.
[16] Younus M，Rehman N U. Optik，2017，130：877.
[17] LI Lei，CHEN Xiao-dong，YUAN Cheng-xun（李磊，陈晓东，袁承勋）. Chinese Journal of Luminescence（发光学报），2019，40(8)：1049.
[18] Asenjo-Castillo Jose，Vargads-Blanco Ivan. Revista Tecnologia en Marcha，2016，29（4）：47.
[19] YU Zhe，ZHANG Zhi-tao，ZHAO Jian-sen（俞晢，张芝涛，赵建森）. Physics Experimentation（物理实验），2010，30(1)：1.
[20] LI Fang-hui，HE Zhong-wen，CAO Wei（李方辉，何中文，曹为）. Spectroscopy and Spectral Analysis（光谱学与光谱分析），2020，40（11）：3613.
[21] Chen W，Chen J R，Li R. Applied Surface Science，2008，254（9）：2882.