光谱学与光谱分析 |
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UV-Vis Spectrometric Characterization of the Composition of Active Complex in the Ni-P Plating Solution |
WANG Xu-cheng, CAI Wen-bin, WANG Wei-jiang, LIU Hou-tian* |
Department of Chemistry, Fudan University, Shanghai 200433, China |
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Abstract A strong complex agent is normally used in the alkaline chemical plating solution for Ni-P plating in order to prevent Ni ion from precipitation by hydrolysis. To keep a stable pH condition, an NH3-NH4Cl buffer system is used. Traditionally, it is considered that NH3 does not participate in the complex because of the relatively low Ni-NH3 complexing constant,but some experimental results cannot be explained reasonably. Touhami etc. have proposed a ternary Ni-citrate-NH3 complex involved in the discharge process,however they cannot give the direct support on the presence of this complex in solution. In this paper, a UV-Vis spectrometric study was carried out to identify the nickel complex in the Ni-P plating solution, and the results indicated the presence of both Ni-cit binary complex and Ni-cit-ammonia ternary complex. After the systematic investigation of the dependence of UV-Vis spectra on the two ligands (cit and ammonia), the composition of this Ni-cit-ammonia ternary complex was supposed to be Ni(Ⅱ)(C6H5O3-7)(NH3)3.
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Received: 2003-05-06
Accepted: 2003-08-26
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Corresponding Authors:
LIU Hou-tian
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Cite this article: |
WANG Xu-cheng,CAI Wen-bin,WANG Wei-jiang, et al. UV-Vis Spectrometric Characterization of the Composition of Active Complex in the Ni-P Plating Solution [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2004, 24(07): 837-840.
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http://www.gpxygpfx.com/EN/Y2004/V24/I07/837 |
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