Abstract:The process of atomic hydrogen emission in CH4/H2 gas mixture in EACVD is simulated by Monte Carlo method. In the simulation two basic types of collision between electron and H2 molecule are considered: elastic collision and inelastic collision. Four types of inelastic processes have been considered, namely vibrational excitation, dissociation, electron excitation (contains Hα, Hβ and Hγ) and ionization. For e-CH4 collision, elastic momentum transfer, vibrational excitation, dissociation, dissociative excitation (contains Hα, Hβ and Hγ), ionization and dissociative ionization are considered. The relationship between the number of H, CH3 and the ratio of atomic hydrogen emission line intensity under different experimental conditions is investigated. A method to obtain the optimum experimental condition for diamond deposition by the atomic hydrogen emission line is given. The result is of great importance to depositing high quality diamond films by controlling the conditions of technology efficiently.
尚 勇,董丽芳*,王志军. 氢原子谱线与高质量金刚石薄膜[J]. 光谱学与光谱分析, 2005, 25(06): 801-803.
SHANG Yong,DONG Li-fang*,WANG Zhi-jun. Atomic Hydrogen Emission Line and the High Quality Diamond Film. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2005, 25(06): 801-803.
[1] Dong L F, Zhang Y H, Ma B Q,et al. Diamond Relat. Mater., 2002, 11: 1648. [2] DONG Li-feng, CHEN Jun-ying, DONG Guo-yi,et al. Chinese Physics, 2002, 11(5): 419. [3] DONG L F, CHEN J Y, LI X W,et al. Thin Solid Films, 2001, 390: 93. [4] DONG Li-fang, ZHANG Yu-hong(董丽芳, 张玉红). Spectroscopy and Spectral Analysis(光谱学与光谱分析), 2002, 22(5): 732. [5] Yarbrough W A, Tankala K, Mecray M,et al. Apply Phys. Lett., 1992, 60(17): 2068. [6] Saelee H T, Lucas J. J. Phys. D, 1977, 10: 343. [7] Shigesato Y, Boekenhauer R E, Sheldom B W. Appl. Phys. Lett., 1993, 63: 314