Abstract：The process of atomic hydrogen emission in the CH4/H2 gas mixture in EACVD was simulated by Monte Carlo method. In the simulation the collision between electron and H2 molecule has two basic types: elastic collision and inelastic collision. Four types of inelastic processes have been considered, namely vibrational excitation, dissociation, electron excitations and ionization. For e-CH4 collision, elastic momentum transfer, vibrational excitation, dissociation, ionization, and dissociation ionization were considered. The relationship between the numbers of H, and CH3, and the atomic hydrogen emission line intensity under different experimental conditions was investigated. A method of extrapolating the optimum experimental condition for diamond deposition by the atomic hydrogen emission line is given. The result is of great importance to depositing high quality diamond films by controlling the conditions of technology efficiently.
董丽芳，王志军，尚 勇. EACVD中的Hα谱线与最佳生长条件[J]. 光谱学与光谱分析, 2005, 25(10): 1545-1547.
DONG Li-fang, WANG Zhi-jun, SHANG Yong. Hα Line and the Optimum Experimental Condition for Diamond Deposition in EACVD. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2005, 25(10): 1545-1547.
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