The Influential Factors of MOCVD Growth of InP in Opals
TAN Chun-hua1, FAN Guang-han2, HUANG Xu-guang1*
1. Laboratory of Photonic Information Technology, School for Information and Optoelectronic Science and Engineering, South China Normal University, Guangzhou 510631, China 2. Institute of Optoelectronic Materials and Technology, School for Information and Optoelectronic Science and Engineering, South China Normal University, Guangzhou 510631, China
Abstract:The key problem of fabricating the 3-D InP inverse opal photonic crystal is to increase the loading of InP in opals. In the present paper, low-pressure metal-organic chemical-vapour deposition (MOCVD) was used to infill the voids within synthetic opals with InP. The morphologies and optical properties of SiO2-InP photonic crystal were characterized by scanning electron microscopy and ultraviolet-visible spectrophotometry (UV-Vis). Several series of experiments were carried out in order to analyze the factors that influence the loading of InP in opals and determine the optimal InP growth conditions. The results of optical experiments are in good agreement with those derived from the theoretical considerations: By increasing the extent of InP infilling within the voids, the extent of refractive index contrast between the silica spheres and the void as well as the extent of natural optical properties change of the photonic crystal were increased. Cycle growth,low-pressure growth, and using the match substrate and the same configuration character between SiO2 and InP are beneficial to increaseing the extent of InP infilling within the opal voids. The process has been optimized to achieve SiO2-InP photonic crystal with higher loading of InP. The study provides a scientific basis for manufacturing three-dimensional InP inverse opal photonic crystals.
Key words:Photonic crystal;Artificial opal crystal;Photonic band gap;MOCVD;InP
谭春华1,范广涵2,黄旭光1*. 金属有机化学气相沉积法在欧泊空隙中生长磷化铟的影响因素[J]. 光谱学与光谱分析, 2008, 28(12): 2763-2767.
TAN Chun-hua1, FAN Guang-han2, HUANG Xu-guang1*. The Influential Factors of MOCVD Growth of InP in Opals. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2008, 28(12): 2763-2767.
[1] Yablonovitch E. Phys. Rev. Lett., 1987, 58(20): 2059. [2] Sajeev John. Phys. Rev. Lett., 1987, 58(23): 2486. [3] Boris T Kuhlmey, Ross C McPhedran. Physica B: Condensed Matter, 2007, 394(2): 155. [4] Marian Florescu, Hwang Lee, Irina Puscasu, et al. Solar Energy Materials and Solar Cells., 2007, 91(15): 1599. [5] Temelkuran B, Ozbay E. Appl. Phys. Lett., 1999, 74(4): 486. [6] Reese C E, Mikhonin A V, Kamenjicki M, et al. J. Am. Chem. Soc., 2004, 126(5): 1493. [7] Lee Y J, Braun P V. Adv. Mater., 2003, 15(7-8): 563. [8] Xu Zhen-feng, Cao Liang-cai, Tan Qiao-feng, et al. Optics Communications., 2007, 278(1): 211. [9] GAO Hai-chao, DAI Song-tao(高海潮,戴松涛). Spectroscopy and Spectral Analysis(光谱学与光谱分析), 2007, 27(4): 671. [10] Blanco A, Lopez C, Mayoral R, et al. Applied Physics Letters, 1998, 73(13): 1781. [11] Torrecillas R, Blanco A, Brito M E, et al. Acta Materialtia, 2000, 48(8-19): 4653. [12] Blanco Alvaro, Chomski Emmanuel, Grabtchak Serguei. Nature., 2000, 405: 437. [13] Míguez H, Meseguer F, Lopez C, et al. Langmuir., 2000, 16(10): 4405. [14] Míguez H, Chomski E. Advanced Materials., 2001, 13(21): 1634. [15] Michail I Samoilovich, Svetlana M Samoilovich, Andrey V Guryanov, et al. Microelectronic Engineering., 2003, 69(2-4): 237. [16] Yates H M, Flavell W R, Pemble M E, et al. Journal of Crystal Growth, 1997, 170(1-4): 611. [17] Míguez H, Blanco A, Meseguer F, et al. Physical Review B., 1999, 59(3): 1563. [18] Romanov S G, Johnson N P, Fokin A V, et al. Applied Physics Letters, 1997, 70(16): 2091. [19] Yates H M, Pemble M E, Míguez H, et al. Journal of Crystal Growth, 1998, 193(1-2): 9. [20] Theodoropoulos C, Ingle N K, Mountziaris T J. J. Electrochem. Soc., 1995,142(6): 2086