Identification and Characteristic Analysis of Partial Discharge Emission Spectra of CF3SO2F
DUAN Jun-ran1, 2*, GAO Ke-li3, LIU Wei4, YAN Xiang-lian3, ZHU Shan4, ZHANG Guo-qiang1, 2, HAN Dong1, 2*
1. Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100190, China
2. University of Chinese Academy of Sciences, Beijing 100049, China
3. China Electric Power Research Institute, Beijing 100192, China
4. State Grid Anhui Electric Power Co. Ltd., Electric Power Science Research Institute, Hefei 230031, China
Abstract：Trifluoromethylsulfonyl fluoride (CF3SO2F) is a novel environmentally friendly insulation gas that has attracted widespread attention due to its excellent insulation strength and environmental friendliness. This paper identifies the emission spectra of CF3SO2F under different discharge modes and analyzes the emission spectral characteristics of radiative particles from the discharge perspective. During corona discharge, CF2 emitted a band spectrum of 200 to 400 nm due to the dissociation of CF3SO2F. The associated steady-state decomposition products include CF4, C2F4, C2F6, C3F8, SO2F2, etc. As the energy provided by the electric field increases, overlapping line and band spectra occur in surface discharge emission spectra. A few elemental particles undergo ionization. In spark discharge, where the energy provided by the electric field is highest, line spectra dominate the emission spectra. Multiple levels of ionization of elemental particles occur. With the increase in energy supplied by the electric field, the ratio of photons in the visible and infrared spectral regions exhibits a “red-shift” phenomenon. The research results indicate that the emission spectra formed by gaseous molecules or elemental particles during partial discharge correlate with steady-state decomposition products. The appearance of characteristic spectra confirms the existence of free radical reactions, while the different ratios of photons reflect the amount of energy provided by the electric field. This study can provide references for the basic physical and chemical properties research of CF3SO2F.
[1] ZHANG Mi, GAO Ke-li, HOU Hua, et al(张 咪, 高克利, 侯 华, 等). High Voltage Engineering(高电压技术), 2023, 49(7): 2816.
[2] WANG Hao, YAN Xiang-lian, HAN Dong, et al(王 浩, 颜湘莲, 韩 冬, 等). High Voltage Engineering(高电压技术), 2022, 48(7): 2625.
[3] YAN Xiang-lian, GAO Ke-li, HAN Dong, et al(颜湘莲, 高克利, 韩 冬, 等). Power System Technology(电网技术), 2023, 47(11): 4790.
[4] ZHOU Zhen-rui, HAN Dong, ZHAO Ming-yue, et al(周朕蕊, 韩 冬, 赵明月, 等). Transactions of China Electrotechnical Society(电工技术学报), 2020, 35(23): 4998.
[5] Casanovas A M, Casanovas J, Dubroca V, et al. Journal of Applied Physics, 1991, 70(3): 1220.
[6] Li Hongyue, Wu Xingwei, Li Cong, et al. Plasma Science and Technology, 2019, 21(7): 074008.
[7] Zhang X, Cui Z, Li Y, et al. IEEE Access, 2018, 6: 72748.
[8] LI Yan-fei, TANG Bei-bei, HAN Dong, et al(李彦飞, 汤贝贝, 韩 冬, 等). Transactions of China Electrotechnical Society(电工技术学报), 2022, 37(7): 1866.
[9] Morozov A, Fraga M M F R, Pereira L, et al. Nuclear Inst and Methods in Physics Research A, 2011, 628(1): 360.
[10] LI Ze，QIAN Yong, ZANG Yi-ming, et al(李 泽, 钱 勇, 臧奕茗, 等). Journal of Shanghai Jiao Tong University(上海交通大学学报), 2023, 57(9): 1176.
[11] Liu F, Wang W C, Zheng W, et al. Plasma Chemistry and Plasma Processing, 2006, 26(5): 469.
[12] LI Yan-fei, HAN Dong, QIU Zong-jia, et al(李彦飞, 韩 冬, 邱宗甲, 等). Spectroscopy and Spectral Analysis(光谱学与光谱分析), 2022, 42(9): 2956.
[13] Long Yunxiang, Guo Liping, Wang Yi, et al. Industrial and Engineering Chemistry Research, 2020, 59(24): 11355.
[14] LU Si-min, TANG Bei-bei, GAO Ke-li, et al(逯思敏, 汤贝贝, 高克利, 等). High Voltage Engineering(高电压技术), 2023, 49(11): 4556.
[15] ZHANG Mi，TIAN Ya-feng，GAO Ke-li, et al(张 咪, 田亚锋, 高克利, 等). Chemical Journal of Chinese Universities(高等学校化学学报), 2022, 43(11): 20220424.
[16] Zhang M, Hou H, Wang B. The Journal of Physical Chemistry A, 2023, 127(3): 671.
[17] Binns D F, Mufti A H, Malik N H. IEEE Transactions on Electrical Insulation, 1990, 25(2): 405.
[18] Atomic Spectroscopy Databases. https://www.nist.gov/pml/atomic-spectroscopy-databases, Last accessed on 2024-5-10.
[19] Sarani A, Nikiforov A Y, Leys C. Physics of Plasmas, 2010, 17(6): 063504-1.
[20] ZHENG Guo-jing, JI Zi-hua, YU Xing(郑国经, 计子华, 余 兴). Atomic Emission Spectrometry: Principles and Applications(原子发射光谱分析技术及应用). Beijing: Chemical Industry Press(北京：化学工业出版社), 2010.
