Abstract：Electron excitation temperature and molecule vibrational temperature in argon/air dielectric barrier discharge (DBD) at different gas pressure with water electrodes were studied by using optical emission spectra. The spectral lines of Ar Ⅰ 763.51 nm(2P6→1S5) and ArⅠ 772.42 nm(2P2→1S3) were chosen to calculate electron excitation temperature by the relative intensity ratio method. The emission spectra of nitrogen band of second positive system (C3Πu→B3Πg) were measured at the same time. The molecule vibration temperature was estimated by the emission intensities of different bands with Δν=-1, Δν=-2, and Δν=-3 in nitrogen band of second positive system, using Boltzmann’s plot method. In addition, the relative line intensities of nitrogen (0-0) band of first negative system at 391.4 nm and (0-0) band of second positive system at 337.1 nm were also measured to study the variation of electron energy. It was found that the electron excitation temperature decreased from 4 700 to 3 300 K and the molecule vibrational temperature decreased from 3 200 to 2 900 K with increasing gas pressure from 20 to 60 kPa. Besides, the ratio of I(N+2)/I(N2) also decreased with pressure increasing from 20 to 60 kPa, indicating that the average electron energy decreases with the gas pressure increasing. These results are of great importance to the study of plasma dynamics of dielectric barrier discharge and also to the underlying industrial applications.
Key words：Dielectric barrier discharge;Electron excitation temperature;Molecule vibrational temperature
[1] Kogelschatz U. Plasma Chemistry and Plasma Processing,2003,23(1): 1. [2] Kogelschatz U. IEEE Trans. Plasma Sci.,2002, 30(4): 1400. [3] Yan L, Zhu X H, Xu J J, et al. Plasma Chemistry and Plasma Processing,2005,25(5): 467. [4] Eliasson B, Kogelschatz U. IEEE Trans. Plasma Sci., 1991, 19(2): 309. [5] Liu S H, Neiger M. J. Phys. D: Appl. Phys.,2001, 34(11): 1632. [6] Stefanovic I, Bibinov N K, Deryugin A A, et al. Plasma Sources Sci. Technol.,2001, 10(3): 406. [7] Park H D, Dhali S K. Appl. Phys. Lett.,2000, 77(14): 2112. [8] Mildren R P, Carman R J. J. Phys. D: Appl. Phys.,2001, 34(1): L1. [9] Uhm H S, CHoi E H, Lim Y. Appl. Phys. Letts.,2002, 80(5): 737. [10] Shin Y K, Lee J K, Shon C H. IEEE Trans.Plasma Sci., 1999,27(1): 14. [11] Qayyum A, Shaista Zeb, Naveed M A, et al. J. Quant. Spectrosc. Radiat. Transf., Avaliable Online 24 February,2007. [12] TU Xin, LU Sheng-yong, YAN Jian-hua, et al(屠 昕，陆胜勇，严建华, 等). Spectroscopy and Spectral Analysis(光谱学与光谱分析)，2006,26(10): 1785. [13] Masoud N, Martus K, Figus M, et al. Contrib. Plasma Phys.,2005, 45(1): 30. [14] KANG Zheng-de, PU Yi-kang. Chin. Phys. Lett.,2002, 19(2): 211. [15] Macko P, Martiíovití V. Czechoslovak J. Phys.,2001, 51(5): 491. [16] LIU Shu-hua, MAO Zhi-guo, LI Shu-feng, et al(刘书华, 毛志国, 李树锋, 等). Spectroscopy and Spectral Analysis(光谱学与光谱分析),2006,26(2): 228. [17] DONG Li-fang, RAN Jun-xia, YIN Zeng-qian, et al(董丽芳, 冉俊霞, 尹增谦，等). Spectroscopy and Spectral Analysis(光谱学与光谱分析),2005,25(8): 1184. [18] DONG Li-fang, LIU Feng, LI Shu-feng, et al(董丽芳，刘 峰，李树峰, 等). Spectroscopy and Spectral Analysis(光谱学与光谱分析)，2006,26(5): 802. [19] Choi J H, Lee T, Han I, et al. Plasma Sources Sci. Technol.,2006, 15: 416.
