| 光谱学与光谱分析 |
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| Hα Line and the Optimum Experimental Condition for Diamond Deposition in EACVD |
| DONG Li-fang, WANG Zhi-jun, SHANG Yong |
| College of Physics Science and Technology, Hebei University, Baoding 071002, China |
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Abstract The process of atomic hydrogen emission in the CH4/H2 gas mixture in EACVD was simulated by Monte Carlo method. In the simulation the collision between electron and H2 molecule has two basic types: elastic collision and inelastic collision. Four types of inelastic processes have been considered, namely vibrational excitation, dissociation, electron excitations and ionization. For e-CH4 collision, elastic momentum transfer, vibrational excitation, dissociation, ionization, and dissociation ionization were considered. The relationship between the numbers of H, and CH3, and the atomic hydrogen emission line intensity under different experimental conditions was investigated. A method of extrapolating the optimum experimental condition for diamond deposition by the atomic hydrogen emission line is given. The result is of great importance to depositing high quality diamond films by controlling the conditions of technology efficiently.
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Received: 2004-05-25
Accepted: 2004-08-28
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Corresponding Authors:
DONG Li-fang
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| Cite this article: |
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DONG Li-fang,WANG Zhi-jun,SHANG Yong. Hα Line and the Optimum Experimental Condition for Diamond Deposition in EACVD[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2005, 25(10): 1545-1547.
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| URL: |
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https://www.gpxygpfx.com/EN/Y2005/V25/I10/1545 |
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