| 光谱学与光谱分析 |
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| Optical Emission Analyses of N2/TMG ECR Plasma for Deposition of GaN Film |
| FU Si-lie1, WANG Chun-an2, CHEN Jun-fang1 |
1. School of Physics and Communication Engineering, Laboratory of Quantum Information Technology, South China Normal University, Guangzhou 510006, China
2. School of Electronic and Information, Guangdong Polytechnic Normal University, Guangzhou 510665, China |
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Abstract The optical emission spectroscopy of hybrid N2/trimethylgallium (TMG) plasma in an ECR-PECVD system was investigated. The results indicate that the TMG gas is strongly dissociated into Ga*, CH and H even under self-heating condition. Ga species and nitrogen molecule in metastable state are dominant in hybrid ECR plasma. The concentration of metastable nitrogen molecule increases with the microwave power. On the other hand, the concentration of excited nitrogen molecules and of nitrogen ion decreases when the microwave power is higher than 400 W.
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Received: 2012-09-03
Accepted: 2012-12-08
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Corresponding Authors:
FU Si-lie
E-mail: fusl@scnu.edu.cn
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