| 光谱学与光谱分析 |
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| Method to Measure Spectrum Intensity from Laser Plasma Soft X-ray Source |
| NI Qi-liang, GONG Yan, CHEN Bo, CAO Jian-lin |
| State Key Lab of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130022，China |
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Abstract This paper presents a method to detect and measure spectrum intensity from a laser plasma soft X-ray source. A Channel Electron Multiplier (CEM) and a caliberated silicon photodiode were used as detectors in this method, the former is a nonstandard detector and the latter is a standard one. Charge-sensitive preamplifiers were used for measuring total charges generated by detectors, and a monochromator with high resolution was employed as the spectrometer． The formulae to calculate spectrum intensity from laser plasma soft X-ray source was given, based on the known grating efficiency of the monochromator, CEM’s gain and responsivity of the silicon photodiode to photons.
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Received: 2002-08-15
Accepted: 2002-12-28
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Corresponding Authors:
NI Qi-liang
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| Cite this article: |
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NI Qi-liang,GONG Yan,CHEN Bo, et al. Method to Measure Spectrum Intensity from Laser Plasma Soft X-ray Source [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2004, 24(01): 1-3.
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| URL: |
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http://www.gpxygpfx.com/EN/Y2004/V24/I01/1 |
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