| 光谱学与光谱分析 |
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| Analysis of Films by X-Ray Fluorescence Spectrometry |
| HAN Xiao-yuan, ZHUO Shang-jun*, WANG Pei-ling |
| Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China |
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Abstract As a quantitative method of film sample, the X-ray fluorescence (XRF) technique has been used extensively because it is non-destructive, fast and accurate. Moreover it could determine the concentration and thickness of film sample simultaneously. A review was given of the study on the quantitative method of films by X-ray fluorescence spectrometry, in which the theoretical calculation of fluorescence intensity, the matrix effects and the methods for their correction, the sources of errors, the software for quantitative analysis, and the application of the method were summarized and discussed. New development and application of films characterization by X-ray fluorescence spectrometry were also expected. Because the similar calibration specimen for film sample is difficult to prepare and the fundamental parameter method could quantitatively analyze film samples even if only the pure element specimen is employed, the fundamental parameter method is studied extensively. The fundamental parameter method was introduced mainly in the present article, including the fundamental parameter equations to calculate the theoretical intensity of fluorescence, the source of error in calculation, and the software for analysis.
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Received: 2004-10-29
Accepted: 2005-03-20
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Corresponding Authors:
ZHUO Shang-jun
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| Cite this article: |
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HAN Xiao-yuan,ZHUO Shang-jun,WANG Pei-ling. Analysis of Films by X-Ray Fluorescence Spectrometry[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2006, 26(01): 159-165.
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https://www.gpxygpfx.com/EN/Y2006/V26/I01/159 |
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