New Design of Grimm-Type Glow Discharge Source for Real-Time Sputtered Depth Measurement
WAN Zhen-zhen1, LI Xiao-jia1, WANG Yong-qing2, SUN Rong-xia2, SHI Ning3
1. Central Iron & Steel Research Institute, National Testing Center of Iron & Steel, Beijing 100081, China 2. College of Electronic & Informational Engineering, Hebei University, Baoding 071002, China 3. College of Software, Beihang University, Beijing 100191, China
Abstract:The crater depth value of sample surface during sputtering is important analysis information for the depth profile analysis of glow discharge spectrometry. Real-time sputtered depth measurement with Laser triangulation measurement method for glow discharge compositional analysis, effectively solves the issues of incorrect depth value calculation and complicated procedures in traditional depth analysis method. This paper presents a new Grimm-type glow discharge source for real-time sputtering depth measurement by laser displacement sensor. This GD source also ensures fine sputtering effects and ideal resolution for multi-layer structure and interface. Optical fiber is used to transmit glow spectrum signal from GD-source to multi-channel photoelectric detection system. The design for the first time accomplishes the real-time signal collection and time-based synchronization analysis for both spectrum signal and sputtering depth signal. The real-time sputtering depth measurement curve of standard samples is obtained. The design and operating principle of this new-type GD-source is described in detail. Under the sputtering conditions of 30 mA, 900 V and 20 minutes, the sputtering rates of iron-based and copper-based sample sputtered by this GD source with good depth resolution are about 10 and 55 nm·s-1. Surface topography picture of sputtering crater and microphotograph of metal samples are provided in the paper. Low-alloy steel standard sample is tested with this new GD source, the relative standard deviation (RSD) of C, Cu, Al, Ni, Mo, Mn and V elements are less than 1.7%, while for Cr and Si elements RSDs are less than 2.6%. The result data of the testing is provided in this paper.
万真真1,李小佳1,王永清2,孙荣霞2,施 宁3 . 用于实时溅射深度测量的新型Grimm辉光放电光源的设计 [J]. 光谱学与光谱分析, 2011, 31(04): 1142-1146.
WAN Zhen-zhen1, LI Xiao-jia1, WANG Yong-qing2, SUN Rong-xia2, SHI Ning3 . New Design of Grimm-Type Glow Discharge Source for Real-Time Sputtered Depth Measurement . SPECTROSCOPY AND SPECTRAL ANALYSIS, 2011, 31(04): 1142-1146.
[1] Kenneth Marcus R, Jose Brokaert A C. Glow Discharge Plasmas in Analytical Spectroscopy. Chichester, West Sussex, England: John Wiley & Sons Ltd, 2003. [2] Payling R, Jones D G, Bengtson A. Glow Discharge Optical Emission Spectrometry. Chichester, West Sussex, England: John Wiley & Sons Ltd, 1997. [3] Michael R Winchester, Richard Payling. Spectrochimica Acta Part B 59, 2004: 607. [4] Ferreira N P, Strauss J A, Human H G C. Spectrochimica Acta, 1983, 38B: 899. [5] Chris Xhoffer, Henri Dillen. J.Anal. At. Spectrom, 2003, A18: 576. [6] Shimizu K, Habazaki H, Skeldon P, et al. Surface and Interface Analysis, 1999, 27: 998. [7] Hoffmann Volker, Dorka Roland, Wilken Ludger, et al. Surface and Interface Analysis, 2003, 35: 575. [8] Angeli Johann, BengtsonArne, Bogaerts Annemie, et al. J. Anal. At. Spectrum., 2003, 18: 670. [9] Bengtson A. Spectrochimica Acta, 1994, 49B(4): 411. [10] Matthew L Hartenstein, Kenneth R Marcus. Surface and Interface Analysis, 1999, 27: 962. [11] Wilken L, Hoffmann V, Wetzig K. Journal of Analytical Atomic Spectrometry, 2003, 18: 1133. [12] Boumans P W J M. Analytical Chemistry, 1972, 44(7): 1219. [13] LI Yi-mu, DU Chao-hui, ZHANG Han-qi(李一木, 杜朝晖, 张寒琦). Chinese Journal of Analytical Chemistry(分析化学), 1996, (1): 15. [14] JIANG Zu-cheng, TIAN Li-qing, CHEN Xin-kun(江祖成, 田笠卿, 陈新坤). Modern Atomic Emission Spectrometry(现代原子发射光谱分析). Beijing: Science Press(北京: 科学出版社), 1999. [15] Bogaerts A, Gijbels R. Spectrochimica Acta Part B 53, 1998: 437. [16] Sugai Hideo(管井秀郎). Plasma Electronic Engineering(等离子体电子工程学). Translated by ZHANG Hai-bo, ZHANG Dan(张海波, 张 丹,译). Beijing: Science Press(北京: 科学出版社). Japan: Ohmsha, Ltd(日本: OHM社), 2002. [17] Grais K I, Eid M A, Al-AShkar E A, et al. The European Physical Journal Applied Physics, 2003, 21: 213. [18] WANG Xiao-jia, GAO Jun, WANG Lei(王晓嘉, 高 隽, 王 磊). Chinese Journal of Scientific Instrument(仪器仪表学报), 2004, 25(4): 601. [19] HUANG Zhan-hua, CAI Huai-yu, LI He-qiao, et al(黄战华, 蔡怀宇, 李贺桥, 等). Opto-Electronic Engineering(光电工程), 2002, 29(3): 58.