Abstract：The EUV imager is used to observe the 30.4 nm radiation of the earth’s plasmasphere on the lunar surface. The 30.4 nm multilayer is the key optical part of the imager. According to the technical parameters, the B4C/Mg, B4C/Mg2Si, B4C/Al, B4C/Si, Mo/Si and so on were chosen. The period thickness, ratio of the material and the number of the periods were optimized and the reflectivity of those multilayers were calculated. In consideration of the lunar enviro nment, the Mo/Si and the B4C/Si multilayer were deposited by magnetron sputtering coating plant. The reflectivity of Mo/Si and B4C/Si multilayer at 30.4 nm is 15.3% and 22.8% respectively.
[1] Laakso H, Jarva M. J. Atmos. Solar Terr. Phys., 2001, 63(11), 1171. [2] CHEN Bo，HE Fei(陈 波, 何 飞). Opt. Precision Eng.(光学精密工程) 2011，19(9): 2057. [3] Farrugia C J, Geiss J, Young D T, et al. Adv. Space. Res., 1988, 8(8): 25. [4] Farrugia C J, Young D T, Geiss J, et al. J. Geophys Res., 1989, 94(A9): 11865. [5] Comfort R H, Newberry I T, Chappell C R. Modeling Magnetospheric Plasma, Geophys Monogr Ser, Washington DC: AGU, 1988, 44: 107. [6] Ratcliffe J A, ed. New York: Academic Press, 1960. 202. [7] Brandt J C. Astrophys. J., 1961, 134(2): 975. [8] Meier R R. Space Sci. Rev., 1991, 58: 1. [9] Yoshikawa I, Nakamura M, Hirahara M, et al. J. Geophys. Res., 1997, 102(A9): 19897. [10] Nakamura M, Yamashita K, Yoshikawa I, et al. Earth Planets Space, 1999, 51: 61. [11] Yamamoto T, Tsuruda K. Earth Planets Space, 1998, 50: 175. [12] Nakamura M, Yoshikawa I, Yamazaki A, et al. Geophys. Res. Lett., 2000, 27(2): 141. [13] YE Pei-jian，PENG Jing(叶培建, 彭 兢). Deep Space Exploration(深空探测研究), 2007，5(1): 1. [14] OUYANG Zi-yuan, ZOU Yong-liao, LI Chun-lai(欧阳自远，邹永廖，李春来). The Moon-Human Toward Deep Space Outpost(月球-人类走向深空的前哨站). Beijing: Tsinghua University Press(北京: 清华大学出版社)，2002. 25. [15] Henke B L, Lee P, Tanaka T J, et al. AIP Proc. 75 Atom. Data and Nucl. Tables, 1982, 27: 1.
