磁场增强型高通量辉光放电溅射源的设计与研究

沈懿璇^1,², 万真真^3,^*, 余兴^2,^4,^*, 王海舟^2,^4,^*, 王永清³, 朱一妃^2,⁴, 刘少锋³

Design and Research of Magnetically Enhanced High-Throughput Glow Discharge Sputtering Source

SHEN Yi-xuan^1,², WAN Zhen-zhen^3,^*, YU Xing^2,^4,^*, WANG Hai-zhou^2,^4,^*, WANG Yong-qing³, ZHU Yi-fei^2,⁴, LIU Shao-feng³

Mo(325.16 nm)的光谱强度 (a): 100 mA; (b): 110 mA; (c): 120 mA; (d): 130 mA