Abstract：Extreme ultraviolet lithography is one of the most promising technologies on the next generation of high-capacity integrated circuit manufacturing. However, techniques for ion debris mitigation have to be considered in the application of extreme ultraviolet source for lithography. In our paper the dynamics of ion debris from Sn plasma by using dual ns laser pulses were investigated. The results show that debris from plasma greatly depends on the energy of pre-pulse and the delay time between the two laser pulses. The energy of Sn ions debris was efficiently mitigated from 2.47 to 0.40 keV in the case of dual laser pulses, up to 6.1 times lower than that by using single laser pulse. We also found that Sn ions debris can be mitigated at all angles by using the dual laser pulses method.
刘超智，窦银萍，张 龙，孙长凯，郝作强*，林景全 . 双脉冲激光锡等离子体光源的碎屑动力学研究 [J]. 光谱学与光谱分析, 2015, 35(01): 44-47.
LIU Chao-zhi, DOU Yin-ping, ZHANG Long, SUN Chang-kai, HAO Zuo-qiang*, LIN Jing-quan . Research on the Dynamics of Ion Debris from Sn Plasma by Use of Dual Laser Pulses . SPECTROSCOPY AND SPECTRAL ANALYSIS, 2015, 35(01): 44-47.
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