Preparation and Spectroscopy Investigation of Vanadium Oxide Films Deposited by DC Magnetron Sputtering
LI Li-sha1，CUI Hai-ning2*，JIANG Zhen-yi3
1. Department of Physics, Northwest University, Xi’an 710069, China 2. College of Physics, Jilin University, Changchun 130012, China 3. Institute of Modern Physics, Northwest University, Xi’an 710069, China
Abstract：Vanadium oxide films were deposited at different substrate temperatures up to 400 ℃ by DC magnetron sputtering, and through the method of the X-ray diffraction, electron scanning microscopy, infrared and Raman spectra, the present paper studies the structure properties of those films, and through the method of spectrum measuring and fitting, this paper studies the optical properties of the films. At low temperature of preparation the optical films have high optical transmittance. The films prepared at low substrate temperature (lower than 200 ℃) have amorphous structure and some films prepared at high substrate temperatures (higher than 200 ℃) have polycrystalline structure. The films’ optical parameters were achieved by using classic model to fit the characteristic of transmittance.
李莉莎1，崔海宁2*，姜振益3 . 直流磁控反应溅射法制备的钒氧化物薄膜及其光谱研究 [J]. 光谱学与光谱分析, 2011, 31(01): 95-99.
LI Li-sha1，CUI Hai-ning2*，JIANG Zhen-yi3 . Preparation and Spectroscopy Investigation of Vanadium Oxide Films Deposited by DC Magnetron Sputtering . SPECTROSCOPY AND SPECTRAL ANALYSIS, 2011, 31(01): 95-99.
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