Study on the Damage of SiO2 Thin Films on LiNbO3 Crystal in Optical Parametric Oscillator by XRD Spectrometry
NIU Rui-hua1，2, HAN Jing-hua1, LUO Jin3, LU Feng1, ZHU Qi-hua3, LI Tong2, YANG Li-ming3, FENG Guo-ying1, ZHOU Shou-huan1*
1. College of Electronics and Information Engineering, Sichuan University, Chengdu 610064, China 2. Southwest Institute of Technical Physics, Chengdu 610041, China 3. Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China
Abstract：In an attempt to elucidate the damage in high transmission thin films on LiNbO3 crystal in optical parametric oscillator, the authors employed XRD spectrometry to investigate the spectrum of laser-induced damage in thin film as well as the morphology of the damage. The authors observed that the damage of thin film was characterized by the depressions/craters in the surface of the films, which were surrounded by a deposition layer with the deceasing thickness from the center of the craters. The XRD measurements indicate that the film was crystallized. The authors analyzed the causes of morphologies and the mechanism of crystallization with the aid of the model for impurity-induced damage in thin solid films. The crystallization was due to the solidification of liquid and gaseous mixtures that result from the strong absorbing to the incident laser. The crater was generated because the mixtures were ejected under the extensive pressure of the laser plasma shock wave. During the process that the mixtures deposit around the craters, the density of the mixtures will decrease and crystallization takes place. As a result, the color of the deposition layer becomes lighter from inside to outside, and the crystallization of the thin film materials was observed by XRD spectrometry.
牛瑞华1，2，韩敬华1，罗 晋3，卢 峰1，朱启华3，李 彤2，杨李茗3，冯国英1，周寿桓1* . 基于XRD光谱法的光参量振荡铌酸锂晶体SiO2薄膜损伤研究 [J]. 光谱学与光谱分析, 2010, 30(12): 3430-3434.
NIU Rui-hua1，2, HAN Jing-hua1, LUO Jin3, LU Feng1, ZHU Qi-hua3, LI Tong2, YANG Li-ming3, FENG Guo-ying1, ZHOU Shou-huan1* . Study on the Damage of SiO2 Thin Films on LiNbO3 Crystal in Optical Parametric Oscillator by XRD Spectrometry . SPECTROSCOPY AND SPECTRAL ANALYSIS, 2010, 30(12): 3430-3434.
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