Abstract：In the present paper, atomic absorption spectrometry(AAS), inductively-coupled plasma mass spectrometry (ICP-MS), transmission electron microscopy (TEM), X-ray diffraction (XRD) and laser Raman spectroscopy (RM) were employed to study the commercial ultra-fine diamond powders prepared by the static pressure-catalyst method and used in magnetic head polishing slurry. The results of AAS and ICP-MS indicated that there were silicon oxide, Fe, Ni, Al and some other metal elements in the ultra-fine powders. XRD patterns showed the peaks of SiO2 at 2θ=35.6°, 39.4° and 59.7°and diamond sharp peaks in agreement with the results above. Diamond sharp peaks implied perfect crystal and high-hardness beneficial to high-efficiency in polishing. The broader Raman band of graphite at 1 592 cm-1 observed by Raman analysis proved graphite existing in the diamond powders. In the TEM images, the size of ultra-fine powders was estimated between 0.1 and 0.5 μm distributed in a wide scope, however, sharp edges of the powder particles was useful to polish. The ultra-fine diamond powders have many advantages，for example, high-hardness, well abrasion performance, high-polishing efficiency and being useful in magnetic head polishing slurry. But, the impurities influence the polishing efficiency, shortening its service life and the wide distribution reduces the polishing precision. Consequently, before use the powders must be purified and classified. The purity demands is 99.9% and trace silicon oxide under 0.01% should be reached. The classification demands that the particle distribution should be in a narrower scope, with the mean size of 100 nm and the percentage of particles lager than 200 nm not over 2%.
Key words：Magnetic head polishing slurry;Ultra-fine diamond powder;Characterization
靳洪允,侯书恩,潘勇,肖红艳. 磁头抛光液用金刚石超微粉研究[J]. 光谱学与光谱分析, 2008, 28(05): 1016-1019.
JIN Hong-yun,HOU Shu-en,PAN Yong,XIAO Hong-yan. The Study of Ultra-Fine Diamond Powder Used in Magnetic Head Polishing Slurry. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2008, 28(05): 1016-1019.
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