%A %T Quantitative Analysis of Trace O Concentration in SF6 with Laser-Induced Breakdown Spectroscopy %0 Journal Article %D 2017 %J SPECTROSCOPY AND SPECTRAL ANALYSIS %R 10.3964/j.issn.1000-0593(2017)12-3865-06 %P 3865-3870 %V 37 %N 12 %U {https://www.gpxygpfx.com/CN/abstract/article_9551.shtml} %8 2017-12-01 %X Sulfur hexafluoride (SF6) is widely used in gas-insulated high-voltage equipments due to its excellent insulation and arc extinguishing performance. However, when impurities such as trace water and oxygen are present in SF6, the by-products, which are formed due to equipment faults and partial discharge, can react with these impuriti to form stable sulfur oxyfluorides. The equipment insulation performance can be degraded significantly by those stable sulfur oxyfluorides, causing threat to the safety of the power system. The detection and analysis of the impurities such as water, oxygen and decompositions in SF6 are therefore of great importance. In this paper, laser-induced breakdown spectroscopy is employed to measure trace O in SF6. CaF2 is used as window material to solve the degradation of the excitation energy caused by the corrosion of the window material by SF6 decompositions, to eliminate the pollution problem caused by the reaction between the window material and the breakdown products of SF6 gas, and to reduce the change of plasma state caused by the change of excitation condition. By correcting the spectral baseline with an iterative wavelet transform and suppressing the noise with a wavelet transform with soft thresholding, a limit of detection of 38ppm is achieved from the experimental calibration curve. Furthermore, a quantitative model based on partial least squares (PLS) is developed to achieve better stability and precision.