|
|
|
|
|
|
| Effect of Plasma Density on Discharge Produced Plasma Extreme Ultraviolet Source |
| XU Qiang1, ZHAO Yong-peng2, WANG Qi2, YANG Yong-tao1 |
1. College of Science, Northeast Forestry University, Harbin 150040, China
2. National Key Laboratory of Science and Technology on Tunable Laser, Harbin Institute of Technology, Harbin 150001, China |
|
|
|
|
Abstract Condition of the plasma is one of the key factors affecting the power and the conversion efficiency of the expreme ultraviolet(EUV) source. The effects of the Xe flow rate on spectra and plasma for discharge produced plasma extreme ultraviolet source were investigated theoretically and experimentally, which was important to optimize the running condition of the EUV source. Moreover, the relationship between the distributions of abundances of ions and electron temperature as well as the density under non-local thermodynamic equilibrium were simulated with the Collisional-Radiation model. The variation tendency of the intensity for Xe8+~Xe11+ 4d—5p transitions on electron temperature was derived. The spectra detected by the rowland spectrometer was detected and analyzed under different density of the plasma with the capillary discharge produced plasma technology. Meanwhile, the effect of Xe gas flow rate on the condition of the plasma was studied as well. The experiments and theory showed that, during the Z-pinch process, the temperature decreased when the flow rate of Xe was increasing. And the average electron temperature was approximated to 29 eV when the current was 28 kA and the flow rate of Xe was 0.4 sccm. Meanwhile, the optimal flow rate for 13.5 nm(2%bandwidth) emission, mainly due to 4d—5p transition of Xe10+ ions, was among 0.3~0.4 sccm.
|
|
Received: 2015-11-24
Accepted: 2016-03-11
|
|
|
|
[1] Hosokai T, Yokoyama T, Zhidkov A, et al. Journal of Applied Physics, 2008, 104(5): 053306.
[2] Sizyuk T, Hassanein A. Physics of Plasmas, 2014, 21(8): 083106.
[3] Akel M, Salo S A, Saboohi S, et al. Vacuum, 2014, 101: 360.
[4] Tao W, Xinbing W, Shaoyi W. Plasma Science & Technology, 2013, 15(5): 435.
[5] Tobin I, Juschkin L, Sidelnikov Y, et al. Applied Physics Letters, 2013, 102(20): 203504.
[6] Xu Q, Zhao Y, Xie Y, et al. The European Physical Journal D, 2014, 68(3): 40.
[7] Benk M, Bergmann K. Journal of Micro/Nanolithography, MEMS, and MOEMS, 2012, 11(2): 021106.
[8] Zuppella P, Reale A, Ritucci A, et al. Plasma Sources Science and Technology, 2009, 18(2): 025014.
[9] Zeng J, Gao C, Yuan J. The European Physical Journal D, 2010, 60(2): 309.
[10] Fahy K, Dunne P, Mckinney L, et al. Journal of Physics D: Applied Physics, 2004, 37(23): 3225.
[11] Borisov V M, Eltsov A V, Ivanov A S, et al. Journal of Physics D: Applied Physics, 2004, 37(23): 3254.
[12] BWering N. Journal of Applied Physics, 2004, 95(1): 16.
[13] Poirier M, Blenski T, De Gaufridy De Dortan F, et al. Journal of Quantitative Spectroscopy and Radiative Transfer, 2006, 99(1-3): 482.
[14] Gilleron F, Poirier M, Blenski T, et al. Journal of Applied Physics, 2003, 94(3): 2086.
[15] Platonov Y, Rodriguez J, Kriese M, et al. EUV and X-Ray Optics: Synergy between Laboratory and Space Ⅱ, 2011: 80760N.
[16] Xu Q, Zhao Y, Liu Y, et al. The European Physical Journal D, 2013, 67(6): 125.
[17] Krücken T, Bergmann K, Juschkin L, et al. Journal of Physics D: Applied Physics, 2004, 37(23): 3213.
[18] Rakowski R, Bartnik A, Fiedorowicz H, et al. Applied Physics B, 2010, 101(4): 773. |
| [1] |
SHEN Xue-jing1，2, LI Dong-ling1，2*, PENG Ya3, WEI Min4, ZHAO Lei1，2, WANG Hai-zhou2，3. Quantitative Distribution Analysis of P/M Super Alloy Composition Based on Micro Beam X-Ray Fluorescence Spectroscopy and Its Application[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2021, 41(03): 727-733. |
| [2] |
TIAN Yi-fu1, LI Bo1, GAO Qiang1*, ZHU Zhi-feng1, ZHU Jia-jian2, LI Zhong-shan1. High Accurate Spatially Resolved Measurements of Discharges Plasma Spectra[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2020, 40(05): 1340-1344. |
| [3] |
LI Miao1, 2, DONG Fa-qin2*, HUO Ting-ting2, 3, ZHOU Lei2, 3, LI Gang2, 3, ZHOU Shi-ping3, 4, WANG Bin2, 3, HE Ping1. Effects of Nitrogen on the Degradation of Methyl Blue by Corona Discharge Plasma[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2018, 38(11): 3354-3361. |
| [4] |
WANG Xiao-hua, LI Wei-feng, GUO Zong-wei, HANG Wei*, HUANG Ben-li. Elemental Analysis of Alloy Sample with Pulsed Micro-Discharge Optical Emission Spectrometry[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2017, 37(06): 1661-1666. |
| [5] |
ZHOU Guang-shun1, WANG Hui-juan1, 2*，WU Qiang-shun1, GUO He1 . Study on Emission Spectrum of Radicals in Remediation System of Polluted Soil with Pulsed Discharge Plasma in Oxygen[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2017, 37(03): 896-901. |
| [6] |
GONG Fa-ping, GAO Li-hong, ZHOU Yong-li, XU Yong* . Diagnosis of Argon Metastable State in Low Pressure DBD Plasma Using Diode Laser Absorption Spectroscopy [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2017, 37(02): 379-386. |
| [7] |
GUO He1, WANG Hui-juan1, 2*, JIA Yuan-yuan3, SUN Chen-jing1, ZHOU Guang-shun1, WU Qiang-shun1, YI Cheng-wu1. Study on Emission Spectrum of OH Radicals in a Combination System of Pulsed Discharge Plasma and Activated Carbon[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2016, 36(12): 4135-4140. |
| [8] |
WU Tao1,2, WANG Xin-bing1*, WANG Shao-yi1, LU Pei-xiang1,2. Characteristics of Extreme Ultraviolet Emission from Tin Plasma Using CO2 Laser for Lithography[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2012, 32(07): 1729-1733. |
| [9] |
WANG Hui-juan1, LI Jie2, CHU Jin-yu1 . References Spectral Analysis of Oxygen Radical in a Synergistic System of Pulsed Discharge Plasma/TiO2 [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2011, 31(01): 58-61. |
| [10] |
DONG Li-fang, Lü Ying-hui, LIU Wei-yuan, YUE Han, LU Ning, LI Xin-chun . Measurement of Plasma Parameters in Slot Microplasma by Optical Emission Spectrum [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2010, 30(12): 3183-3185. |
| [11] |
DONG Li-fang1,YIN Yan1,DONG Jian-ming2 . Determination of Net Electric Field in Dielectric Barrier Discharge in N2 by Relative Spectrum Line Intensity [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2005, 25(10): 1727-1729. |
|
|
|
|
