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SPECTROSCOPY AND SPECTRAL ANALYSIS  2015, Vol. 35 Issue (05): 1436-1439    DOI: 10.3964/j.issn.1000-0593(2015)05-1436-04
光谱学与光谱分析 |
The Stability and Measuring Technology of the Maximum Optical Path Difference of Photo-Elastic Modulator Interferograms
ZHANG Min-juan3, WANG Zhi-bin1, 2, 3, LI Xiao3, LI Jin-hua3, WANG Yan-chao3
1. Key Lab of Instrument Science & Dynamic Measurement, Ministry of Education, North University of China,Taiyuan 030051,China2. National Key Laboratory for Electronic Measurement Technology, North University of China, Taiyuan 030051,China3. Engineering and Technology Research Center of Shanxi Provincial for Optical-Electric Information and Instrument,North University of China,Taiyuan 030051,China