光谱学与光谱分析 |
|
|
|
|
|
Characteristics of Extreme Ultraviolet Emission from Tin Plasma Using CO2 Laser for Lithography |
WU Tao1,2, WANG Xin-bing1*, WANG Shao-yi1, LU Pei-xiang1,2 |
1. Wuhan National Laboratory for Optoelectronics, College of Optoelectronic Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China 2. School of Science, Wuhan Institute of Technology, Wuhan 430074, China |
|
|
Abstract The extreme ultraviolet (EUV) emission characteristics from Sn plasma for lithography produced by a pulse discharge CO2 laser was investigated under different conditions. Extreme ultraviolet spectral measurements were made throughout the wavelength region of 6.5 nm to 16.8 nm using a grazing incidence flat-field spectrograph coupled with an X-ray charge-coupled device camera for detection of time-integrated spectra. The dependence of spectral properties of the EUV emission on pulse duration, incidence pulse energy, and buffer gas pressure was investigated. The results show that the peak of EUV spectra was located at 13.5 nm. The intensity of EUV emission increased with increasing laser energy ranging from 30 mJ to 600 mJ in a nonlinear manner with saturation effect. The critical energy of incident pulse laser for the generation of EUV emission is near 30 mJ in our experiment. The highest conversion efficiency of 1.2% in producing 13.5 nm EUV light with 0.27 nm bandwidth was achieved at pump energy of 425 mJ. The EUV spectra from a plate target produced by laser pulse with full width at half maximum range from 50 ns to 120 ns were recorded and negligible differences in their spectral features noticed even though higher spectral intensity was observed by shorter pulse duration. The 2% in-band EUV intensity with 52 ns pulse duration was 1.6 times higher than that with 120 ns pulse duration due to the increase in laser intensity. It was also found that the detected EUV spectral intensity rapidly decreased with increasing buffer air pressure, and the EUV emission could be totally absorbed at the pressure of 200 Pa, while weak EUV emission could be still detected at the buffer He gas pressure of 7×104 Pa. The experimental results showed that the absorption coefficient of 13.5 nm light at air buffer gas pressure of 100 Pa was 3.0 m-1, while the absorption coefficient was 0.96 m-1 at the same He buffer gas pressure.
|
Received: 2011-11-13
Accepted: 2012-02-08
|
|
Corresponding Authors:
WANG Xin-bing
E-mail: xbwang@mail.hust.edu.cn
|
|
[1] WANG Qi, CHEN Xing-long, YU Rong-hua, et al(王 琦, 陈兴龙, 余嵘华, 等). Spectroscopy and Spectral Analysis(光谱学与光谱分析),2011,31(9):2546. [2] Singh R K, Holland O W, Narayan J. J. Appl. Phys., 1990, 68(1): 233. [3] WU Tao, WANG Xin-bing, TANG Jian, et al(吴 涛, 王新兵, 唐 建, 等). Laser Technology(激光技术), 2011,35(6): 800. [4] Morris O, O’Connor A, Sokell E, et al. Plasma Sources Sci. Technol., 2010, 19(2): 025007. [5] Guo L B, Li M C, Hu W, et al. Appl. Phys. Lett., 2011, 98: 131501. [6] Matsuoka Y, Nakai Y, Fujioka S, et al. Appl. Phys. Lett., 2010, 97: 111502. [7] WU Tao, RAO Zhiming, WANG Shifang. Journal of Physics: Conference Series, 2011, 276: 012031. [8] Bajt S, Alameda J B, Barbee T W, et al. Opt. Eng., 2002, 41(8): 1797. [9] Wu Tao, Wang Xinbing. Chin. Phys. Lett., 2011, 28(5): 055201. [10] Campos D, Harilal S S, Hassanein A, et al. Appl. Phys. Let., 2010, 96: 151501. [11] Yamaura M, Uchida S, Sunahara A, et al. Appl. Phys. Lett., 2005, 86: 181107. [12] Bollanti S, Bonfigli F, Burattini E, et al. Appl. Phys. B: Lasers and Optics, 2003, 76(3): 277. [13] Komori H, Ueno Y, Hoshino H, et al. Appl. Phys. B: Lasers and Optics, 2006, 83(2): 213. [14] Rakowski R, Mikolajczyk J, Bartnik A, et al. Appl. Phys. B: Lasers and Optics, 2010, 102(3): 559. [15] George A S, Silfvast W, Takenoshita K, et al., Proc. of SPIE, 2006, 6151: 615143. [16] Tanaka H, Matsumoto A, Akinaga K, et al. Appl. Phys. Lett., 2005, 87: 041503. [17] Harilal S S, J. Appl. Phys., 2007, 102(12): 123306. [18] Tao Y, Tillack M S, Harilal S S, et al. Opt. Lett., 2007, 32(10): 1338. [19] Yuspeh S, Tao Y, Burdt R A, et al. Appl. Phys. Lett., 2011, 98: 201501. [20] Harilal S S, Sizyuk T, Hassanein A, et al. J. Appl. Phys., 2011, 109(6): 063306. [21] Wu T, Wang X B, WANG S Y, et al. J. Appl. Phys., 2012, 111(6): 063304. [22] Tao Y, Tillack M S, Sequoia K L, et al. Appl. Phys. Lett., 2008, 92: 251501. [23] Masnavi M, Nakajima M, Horioka K, et al. J. Appl. Phys., 2011, 109(12): 123306. [24] Bakshi V, EUV lithography. Washington: SPIE, 2009, 643. |
[1] |
YUAN Kai-xin, ZHUO Jin, ZHANG Qing-hua, LI Ya-guo*. Study on the Spectral and Laser Damage Resistance of CO2 Laser Modified Sol-Gel SiO2 Thin Films[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2023, 43(06): 1752-1759. |
[2] |
XIE Zhuo1, 3, WANG Hai-jian1, DOU Yin-ping1*, SONG Xiao-wei1*, LIN Jing-quan1, 2. Characteristics of Extreme Ultraviolet and Debris Emission From Laser Produced Bi Plasma[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2022, 42(07): 2056-2062. |
[3] |
WANG Yue1, 3, 4, CHEN Nan1, 2, 3, 4, WANG Bo-yu1, 5, LIU Tao1, 3, 4*, XIA Yang1, 2, 3, 4*. Fourier Transform Near-Infrared Spectral System Based on Laser-Driven Plasma Light Source[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2022, 42(06): 1666-1673. |
[4] |
MA Yun-yun1, WANG Yong-qiang2, MIN Qi2, CAO Shi-quan2, ZHANG Zheng-rong1, SU Mao-gen2, SUN Dui-xiong2*, DONG Chen-zhong2. Relative Spectral Intensity Response Calibration of Spectrometers Using Ar Plasma Emission Branching Ratio Method[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2018, 38(05): 1375-1379. |
[5] |
WU Tao1, HE Jun1, WANG Shi-fang2, TANG Chao-hong1. Analysis of UTA Spectra of Nd∶YAG Pulse Laser Produced Mo Plasmas[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2018, 38(03): 692-696. |
[6] |
XU Qiang1, ZHAO Yong-peng2, WANG Qi2, YANG Yong-tao1. Effect of Plasma Density on Discharge Produced Plasma Extreme Ultraviolet Source[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2017, 37(08): 2560-2563. |
[7] |
YAO Hong-bing1, NI Wen-qiang1*, YUAN Dong-qing2, YANG Zhao3, LI Qiang3 . Experimental Investigation on the Electron Temperature of Laser-Induced Mg Plasmas [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2016, 36(12): 3853-3856. |
[8] |
DU Xiao1, YANG Li-jun1, 2*, LIU Tong1, JIAO Jiao1, WANG Hui-chao1 . The Spectral Analysis of Laser-Induced Plasma in Laser Welding with Various Protecting Conditions[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2016, 36(01): 15-19. |
[9] |
LIU Chao-zhi, DOU Yin-ping, ZHANG Long, SUN Chang-kai, HAO Zuo-qiang*, LIN Jing-quan . Research on the Dynamics of Ion Debris from Sn Plasma by Use of Dual Laser Pulses [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2015, 35(01): 44-47. |
[10] |
LI Shi-wen1, 2, ZHANG Qiu-hui3, NIU Rui-hua4 . Thermodynamics Process of Laser Drilling on Copper Surface [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2013, 33(04): 899-902. |
[11] |
WANG Shao-peng1, FENG Guo-ying1, DUAN Tao2, HAN Jing-hua1* . The Deposition of Elements in the Process of Laser Ablation of Silicon [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2013, 33(02): 527-530. |
[12] |
HAN Jing-hua1, ZHANG Xin-gang2, CAI Xiao-tang3, DUAN Tao4, FENG Guo-ying1*, YANG Li-ming5, ZHANG Ya-jun1, WANG Shao-peng1, LI Shi-wen1 . Research on Cells Ablation Characters by Laser Plasma [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2012, 32(08): 2022-2026. |
[13] |
HAN Jing-hua1, DUAN Tao2, FAN Wei-xing1, 3, FENG Guo-ying1*, YANG Li-ming4, NIU Rui-hua1, YANG Jie1, ZHAI Ling-ling1, GUO Chao1. Study on Characteristics of Laser Ablation in KTP Crystal and Its Influence on the Raman Spectroscopy[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2012, 32(07): 1820-1824. |
[14] |
HAN Jing-hua1, DUAN Tao2, GAO Xu-hua3, FENG Guo-ying1*, FAN Wei-xing1,YANG Li-ming3, LIU Yan-yan1, BAO Ling-dong1. The Influence of Laser Plasma Effects on the Characteristics of Thin Film Damage [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2012, 32(05): 1162-1165. |
[15] |
FAN Wei-xing1,2,HAN Jing-hua1,LI Hai-bo3, YANG Li-ming3, FENG Guo-ying1*,GAO Xiang1,LIU Yan-yan1, BAO Ling-dong1,HUANG Yong-zhong1. The Influence of Laser Plasma Effects on the Characteristics of Silicon Surface Damage[J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2011, 31(12): 3185-3189. |
|
|
|
|