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SPECTROSCOPY AND SPECTRAL ANALYSIS  2012, Vol. 32 Issue (07): 1729-1733    DOI: 10.3964/j.issn.1000-0593(2012)07-1729-05
光谱学与光谱分析 |
Characteristics of Extreme Ultraviolet Emission from Tin Plasma Using CO2 Laser for Lithography
WU Tao1,2, WANG Xin-bing1*, WANG Shao-yi1, LU Pei-xiang1,2
1. Wuhan National Laboratory for Optoelectronics, College of Optoelectronic Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China2. School of Science, Wuhan Institute of Technology, Wuhan 430074, China