| 光谱学与光谱分析 |
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| Investigation of Multi-Wavelength Effect During the Measurement of UV-Enhanced Film’s Emission Spectrum |
| LIU Meng, NI Zheng-ji, ZHANG Da-wei, HUANG Yuan-shen, ZHUANG Song-lin |
| College of Optical and Electronic Information Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China |
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Abstract The UV-responsive detector is a dual-use device for civilian and military after the laser and IR-responsive sensors. Typical image sensor coated with a layer of down-convert frequency thin film on it’s photosurface to enhance UV response is the key technology of enhancing UV-response. The UV-enhanced thin film was made in the experimental laboratory using the Zn2SiO4∶Mn phosphor by spin coating method. Two peaks at 520 and 560 nm respectively in the emission spectrum of the UV-enhanced film were found by SP1702 spectrograph when the excitation wavelength was 260 and 280 nm.The peaks were found in the process of experiment of measuring and counting the quantum efficiency of UV-enhanced thin film. But the light peaks at 520 and 560 nm are not the emission light peaks by the exciting light of 260 and 280 nm. The reason why the light at 520 and 560 nm is not the emission light was analyzed based on the measurement principle of grating spectrograph. The reasons for the multi-wavelength of light overlaps during the measurement of emission spectrum were also discussed. And the equipment used to separate the overlapped different wavelengths was designed, which will be used to resolve the problem of the overlap of multi-wavelength.
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Received: 2008-06-26
Accepted: 2008-09-29
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Corresponding Authors:
LIU Meng
E-mail: liumeng573@126.com
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