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SPECTROSCOPY AND SPECTRAL ANALYSIS  2015, Vol. 35 Issue (04): 1084-1088    DOI: 10.3964/j.issn.1000-0593(2015)04-1084-05
光谱学与光谱分析 |
The Influence of Oxygen Incorporation on the Microstructure and Band Gap Properties of the nc-Si Films
JIANG Zhao-yi, YU Wei*, LIU Jian-ping, LIU Hai-xu, YIN Chen-chen, DING Wen-ge*
College of Physics Science and Technology, Hebei University, Key Laboratory of Photo-Electricity Information Materials of Hebei Province, Baoding 071002, China