Study of the Effect of Interference during Multi-Wire GMAW Based on Spectral Diagnosis Technique
XU Chen1, 2, HUA Xue-ming1, 2*, YE Ding-jian1, 2, MA Xiao-li1, 2, LI Fang1, 2, HUANG Ye1, 2
1. Shanghai Key Laboratory of Materials Laser Processing and Modification, School of Materials Science and Engineering, Shanghai Jiaotong University, Shanghai 200240, China
2. Collaborative Innovation Center for Advanced Ship and Deep-Sea Exploration, Shanghai 200240, China
Abstract：During the multi-wire GMAW, the working state of the arc will become unstable because of the arcs interference, which will affect the stability of welding process and welding quality. In this paper, the distribution of the electron temperature of the arc have been researched based on Boltzmann spectrometry. Electron densities under different conditions have also been calculated based on Stark width of the plasma spectrum. Combined with the analysis of high-speed photography, quantitative analysis of the arc interference can be obtained. For double wire case, the results of spectral diagnosis show that when the adding arc current is larger than the original arc, the temperature center of original arc is shifted to the new arc side, and the electron density of the original arc near new arc side is obviously increased. While the current of the new arc is equal to the original arc, the temperature and electron density distribution of the original arc all lead to the instability. In the case of triple-wire, the addition of the third arc causes the temperature distribution of intermediate arc become complex, and its electron density distribution is close to that of single wire case.
Key words：Multi-wire GMAW; Spectral diagnosis; Electron temperature; Electron density
徐 琛，华学明，叶定剑，马晓丽，李 芳，黄 晔. 基于光谱诊断的多丝熔化极气体保护焊电弧干扰分析[J]. 光谱学与光谱分析, 2018, 38(07): 1993-1997.
XU Chen, HUA Xue-ming, YE Ding-jian, MA Xiao-li, LI Fang, HUANG Ye. Study of the Effect of Interference during Multi-Wire GMAW Based on Spectral Diagnosis Technique. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2018, 38(07): 1993-1997.
[1] Ye D J, Hua X M, Xu C, et al. The International Journal of Advanced Manufacturing Technology, 2017. 89: 493.
[2] Valensi F, Pellerin S, Boutaghane A, et al. Journal of Physics D: Applied Physics, 2010, 43: 434002.
[3] Valensi F, Pellerin S, Castillon Q. Journal of Physics D: Applied Physics, 2013, 46: 224005.
[4] Zielińska S, Musio K, Dzierga K, et al. Plasma Sources Science and Technology, 2007, 16: 832.
[5] Cho D W, Song W H, Cho M H, et al. Journal of Materials Processing Technology, 2013, 213: 2278.
[6] Wilhelm G, Kozakov R, Gtt G, et al. Journal of Physics D: Applied Physics, 2012, 45: 085202.
[7] Murphy A B. Journal of Physics D: Applied Physics, 2010, 43: 434001.
[8] LIU Li-ming, HUANG Rui-sheng, CAO Yun-ming(刘黎明, 黄瑞生, 曹运明). Chinese Journal of Lasers(中国激光), 2009, 36(12): 3167.
[9] Griem H R. Principles of Plasma Spectroscopy. Cambridge University Press, 2005. 200.
[10] Pellerin S, Musiol K, Pokrzywka B，et al. Journal of Physics B: Atomic, Molecular and Optical Physics, 1996, 29: 3911.
