Abstract：In order to improve the quantitative analysis accuracy of AES, We associated XPS with AES and studied the method to reduce the error of AES quantitative analysis, selected Pt-Co, Cu-Au and Cu-Ag binary alloy thin-films as the samples, used XPS to correct AES quantitative analysis results by changing the auger sensitivity factors to make their quantitative analysis results more similar. Then we verified the accuracy of the quantitative analysis of AES when using the revised sensitivity factors by other samples with different composition ratio, and the results showed that the corrected relative sensitivity factors can reduce the error in quantitative analysis of AES to less than 10%. Peak defining is difficult in the form of the integral spectrum of AES analysis since choosing the starting point and ending point when determining the characteristic auger peak intensity area with great uncertainty, and to make analysis easier, we also processed data in the form of the differential spectrum, made quantitative analysis on the basis of peak to peak height instead of peak area, corrected the relative sensitivity factors, and verified the accuracy of quantitative analysis by the other samples with different composition ratio. The result showed that the analytical error in quantitative analysis of AES reduced to less than 9%. It showed that the accuracy of AES quantitative analysis can be highly improved by the way of associating XPS with AES to correct the auger sensitivity factors since the matrix effects are taken into account. Good consistency was presented, proving the feasibility of this method.
[1] Corcoran C J, Tavassol H, Rigsby M A, et al. Journal of Power Sources, 2010, 195: 7856. [2] Baer D R, Lea A S, Geller J D, et al. Journal of Electron Spectroscopy and Related Phenomena, 2010, 176: 80. [3] Jablonski A. Surface Science, 2009, 603: 1342. [4] John F. Watts. Surf. Interface Anal.，2010, 42, 358. [5] Seah M P. Analusis, 1981, 9(5): 171. [6] Dawson P T, Tzatzov K K. Surf. Sci., 1985, 149: 105. [7] Seah M P, Gilmore I S. Surface and Interface Analysis, 1998, 26(10): 723. [8] Kim K J, Unger W E S, Kim J W, et al. Surf. Interface Anal.，2012, 44: 192. [9] TAN Wen-shu, DING Ze-jun, ZHANG Zeng-ming(谈文舒, 丁泽军, 张增明). Journal of Chinese Electron Microscopy Society(电子显微学报), 2005, 24(6): 541. [10] Jablonski A, Powell C J. Surface Science, 2012, 606: 644. [11] Seah M P, Gilmore I S, Spencer S J. Journal of Electron Spectroscopy and Related Phenomena, 2001, 120: 93. [12] Reniers F, Tewell C. Journal of Electron Spectroscopy and Related Phenomena, 2005, 142: 1.
