Vibrational Temperature of Plasma Plume in Atmospheric Pressure Air
LI Xue-chen, CHANG Yuan-yuan*, JIA Peng-ying, ZHAO Huan-huan, BAO Wen-ting
Key Laboratory of Photo-Electronics Information Materials of Hebei Province, College of Physics Science and Technology, Hebei University, Baoding 071002, China
Abstract：A tri-electrode discharge device was designed in a dielectric barrier discharge configurations to generate a fairly large volume plasma plume in atmospheric pressure air. The discharge characteristics of the plasma plume were investigated by an optical method. The discharge emission from the plasma plume was collected by a photomultiplier tube. It was found that the number of discharge pulse per cycle of the applied voltage increased with increasing the peak value of the applied voltage. The emission spectra of the plasma plume were collected by a spectrometer. The vibrational temperature was calculated by fitting the experimental data to the theoretical one. Results showed that the vibrational temperature of the plasma plume decreases with increasing the Up. Spatially resolved measurement of the vibrational temperature was also conducted on the plasma plume with the same method. Results showed that the vibrational temperature increases firstly and then decreases with increasing distance from the nozzle. The vibrational temperature reachs its maximum when the distance is 5.4 mm from the nozzle. These experimental phenomena were analyzed qualitatively based on the discharge theory. These results have important significance for the industrial applications of the plasma plume in atmospheric pressure air.
Key words：Plasma plume;Optical emission spectrum;Spatially resolved measurement;Vibrational temperature
李雪辰，常媛媛*，贾鹏英，赵欢欢，鲍文婷 . 大气压空气等离子体羽的振动温度研究 [J]. 光谱学与光谱分析, 2013, 33(07): 1754-1757.
LI Xue-chen, CHANG Yuan-yuan*, JIA Peng-ying, ZHAO Huan-huan, BAO Wen-ting. Vibrational Temperature of Plasma Plume in Atmospheric Pressure Air. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2013, 33(07): 1754-1757.
[1] Ni T L, Ding F, Zhu X D. Appl. Phys. Lett., 2008, 92: 1503. [2] Li Qing, Tidemasa H, Pu Yi-kang, et al. Appl. Phys. Letters, 2011, 98(5): 241501. [3] Ráhel J, Sherman D M. J. Phys. D: Appl. Phys., 2005, 38: 547. [4] Iza F, Kim G J, Lee S M, et al. Plasma Processes Polym., 2008, 5: 322. [5] Fridman G, Friedman G, Gutsol A, et al. Plasma Process. Polym., 2008, 5: 503. [6] Kong M G, Kroesen G, Morfill G, et al. New J. Phys., 2009, 11: 115012. [7] Cheng C, Liu P, Xu L, et al. Chin. Phys. Soc., 2006, 15(07): L1544-5. [8] Chen G L, Chen S H, Zhou M Y, et al. Plasma Sources Sci. Technol., 2006, 15, 603. [9] Lu X P, Xiong Z, Zhao F, et al. Appl. Phys. Letters, 2009, 95: 181501. [10] Li X C, Yuan Y, Jia P Y, et al. Phys. Plasma, 2010, 17: 093504. [11] Hong Y C, Kang W S, Hong Y B, et al. Phys. Plasma, 2009, 16: 123502. [12] LI Xue-chen, YUAN Ning, JIA Peng-ying, et al(李雪辰，袁 宁，贾鹏英，等). Phys. Lett.(物理学报), 2011, 60: 125204.
