Abstract:In order to improve the quality of inductively coupled plasma-atomic emission spectrum and reduce the detection limit of analysis, the influence of potassium additives into water samples on water samples’ spectral intensity and signal-to-background ratio was studied. The excitation temperature and electron density of plasma were measured through multi-line slope and the Stark broadening method. The results demonstrated that the plasma spectral intensity intensity increases to a various degree after adding potassium additives into the sample solution. When the content of the potassium is 1.0 g·L-1, the spectral lines intensity of element Al, Cr, Cu, Mn, Ni and Zn was increased by 8.62%, 32.29%, 108.45%, 6.06%, 64.98% and 54.99% respectively, the spectral signal-background ratio increased by about 7.90%, 30.95%, 104.60%, 5.21%, 66.00% and 52.82%, respectively. Under the conditions of the content of potassium is 1.0 g·L-1 in the sample, the plasma excitation temperature increased by about 239.69 K than that without additive, and the electron density increased by about 4.99×1011 cm-3. It is thus clear that potassium additives can improve the quality of inductively coupled plasma-atomic emission spectrum.
Key words:Inductively coupled plasma;Potassium additive;Spectral intensity;Signal-to-background ratio
[1] Yang X J, Low G K C. Environ. Chem. Lett., 2009, 7: 381. [2] Chope G A,Terry L A. Food Chemistry, 2009, 115: 1108. [3] Yip Y C, Chan K K, Cheung P Y, el at. Food Chemistry, 2009, 112: 1065. [4] WEN Xiang-dong, ZHAO Xi-wen, WEN Bin, et al(闻向东,赵希文,文 斌,等). Metallurgical Analysis(冶金分析), 2008, 28(3):61. [5] Yasuaki O, Keisuke Y, Hiroko K, et al. Applied Spectroscopy, 2009, 63(12): 1403. [6] Lewen N, Nugent D. Journal of Pharmaceutical and Biomedical Analysis, 2010, 52: 652. [7] Zachariadis G A, Sahanidou E. Journal of Pharmaceutical and Biomedical Analysis, 2009, 50: 342. [8] National Standard of the People's Republic of China(中华人民共和国国家标准).GB/T5650—2006. [9] Razic S, Todorovic M, Holclajtner Antunovic I, et al. Fresenius Journal of Analytical Chemistry, 1996, 355(3-4): 274. [10] Zhu X B, Chang X J, Cui Y M, et al. Microchemical Journal, 2007, 86: 189. [11] WU Lan(乌 兰). Chinese Journal of Analysis Laboratory(分析试验室), 2009, 28(11): 81. [12] CHEN Jin-zhong, CHEN Feng-ling, LIU Su-ling, et al(陈金忠,陈凤玲,刘素玲,等). Metallurgical Analysis(冶金分析),2011, 31(3): 1. [13] XIN Ren-xuan(辛仁轩). Plasma Emission Spectroscopy Analysis(等离子体发射光谱分析). Beijing: Chemical Industry Press(北京: 化学工业出版社), 2010. 18. [14] Webb B D, Denton M B. Sperctrchim Acta, 1986, 41B(4): 361.