Study of Emission Spectra of N Atom Generated in Multi-Needle-to-Plate Corona Discharge
GE Hui1, YU Ran1, ZHANG Lu1, MI Dong2, ZHU Yi-min1*
1. Institute of Environment of Remediation, Dalian Maritime University, Dalian 116026, China 2. Department of Physics, Dalian Maritime University, Dalian 116026, China
Abstract：The emission spectra of nitrogen (N) atom produced by multi-needle-to-plate negative corona discharge in air were detected successfully at one atmosphere, and the excited transition spectral line at 674.5 nm with maximum value of relative intensity was selected to investigate the influences of air and electrical parameters on N atom relative density. The results indicate that N atom relative density in ionization region increases with the increase in power; decreases with increasing discharge gap and relative humidity; and with the increase in N2 content, the relative density of N active atom firstly increases and then decreases. Under present experimental conditions, the maximum value of N atom relative density appears at the axial distance from needle point r=1 mm.
Key words：DC corona discharge;Excited N atom;Emission spectra
葛 辉1，于 然1，张 路1，宓 东2，朱益民1* . 多针对板负电晕放电激发态N原子发射光谱研究 [J]. 光谱学与光谱分析, 2012, 32(06): 1483-1486.
GE Hui1, YU Ran1, ZHANG Lu1, MI Dong2, ZHU Yi-min1* . Study of Emission Spectra of N Atom Generated in Multi-Needle-to-Plate Corona Discharge . SPECTROSCOPY AND SPECTRAL ANALYSIS, 2012, 32(06): 1483-1486.
[1] Matsumoto T, Wang D, Namihira T, et al. IEEE Transaction Plasma Sci., 2010, 38(10): 2639. [2] Lin W F, Zhang B, Hou W H, et al. J. Eviron Sci-China, 2009, 21(6): 790. [3] Rajanikanth B S, Sinha D, Emmanuel P. Plasma Sci. Technol, 2008, 10(3): 307. [4] Li J, Shang K F, Wu Y, et al. J. Electrostat, 2007, 65(4): 228. [5] Chang M B, Lee H M, Wu F L, et al. J. Air Waste Manage, 2004, 54(8): 941. [6] Julien D, Astrid B, Francoise C, et al. Chemphyschem, 2010, 11(18): 4002. [7] Huang H B, Ye D Q, Leung Dennis Y C. J. Environ. Eng-ASCE, 2010, 136(11): 1231. [8] Liao X B, Guo Y F, He J H, et al. Plasma Chem. Plasma Processing, 2010, 30(6): 841. [9] Babayan S E, Ding G, Hicks R F. Plasma Chem. Plasma Processing, 2001, 21: 505. [10] Hazama H, Fujiwara M, Tanimoto M. Chem. Phys. Lett., 2000, 323: 542. [11] Aragon C, Aguilera J A. Spectrochim Acta B, 2008, 63(9): 893. [12] LIU Jing，NIU Jin-hai, XU Yong, et al(刘 晶，牛金海，徐 勇, 等). Acta Physico-Chimica Sinica(物理化学学报), 2005, 31(12): 1352. [13] Miyanaga S, Kaneko T, Ishida H, et al. Thin Solid Films, 2010, 518(13): 3509. [14] Yang X, Moravej M, Nowling G R, et al. Plasma Sources Sci. Technol., 2005, 14: 314. [15] Laux C O, Kruger C H, Zare R N. Plasma Sources Sci. Technol., 2003, 12(2): 125. [16] SU Peng-hao, ZHU Yi-min, CHEN Hai-feng(宿鹏浩, 朱益民, 陈海丰). Spectroscopy and Spectral Analysis(光谱学与光谱分析), 2007, 27(11): 2171. [17] YANG Shu, ZHANG Ling-ling, GE Hui, et al(杨 树, 张零零, 葛 辉, 等). Chinese Sciencepaper Online(中国科技论文在线), 2010, 5(5): 377.
