Abstract:In the present work, the spatial distributions of spectrum intensity of molecule and atom in the plasma generated in hollowneedle-plate discharge in atmosphere were measured, and the spatial distribution of electron energy in plasma was analyzed. A plasma about 3cm long is generated by using a hollowneedle-plate discharge device. By collecting optical emission spectrum from 300 to 800 nm, it was found that the spectrum consists of strong ArⅠ lines, strong second positive band system of N2, and weak OⅠ line. The spatial distributions of spectrum intensity of ArⅠ(696.54,763.51,772.42, and 794.82 nm), band N2(337.1,357.6, and 380.4 nm), and OⅠ 777.2 nm were measured. The ArⅠ lines decreased gradually from the arc root. The N2 lines increased gradually from the arc root and declined when they reached a maximum at 12 mm away from the arc root. The intensity of OⅠ increased from the arc root and declined when it reached a maximum at 6 mm away from the arc root. The spatial distribution of electron energy in plasma was analyzed qualitatively from the spatial distribution of spectrum intensity given above. It was found that the electrons located at 6 mm away from the arc root have high energy, while they have low energy at arc tip.
Key words:Plasma arc;Spatial distribution;Electron energy
董丽芳,嵇亚飞,李永辉. 针—板介质阻挡放电中电子能量空间分布研究[J]. 光谱学与光谱分析, 2011, 31(12): 3210-3212.
DONG Li-fang, JI Ya-fei, LI Yong-hui. Study on Spatial Distribution of Electron Energy in Hollowneedle-Plate Dielectric Barrier Discharge. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2011, 31(12): 3210-3212.
[1] Kogelschatz U. IEEE Trans. Plasma Sci., 2002, 30(4): 1400. [2] Mangolini L, Orlov K, Koort shagen U, et al. Appl. Phys. Lett., 2002, 80(10): 1722. [3] HE Xiang, SUN Feng-lou, ZHOU Wu-qing(何 翔,孙奉娄,周武庆). Journal of Materials Science & Engineering(材料科学与工程学报), 2008, 26(4): 570. [4] ZHU Yi-min, KONG Xiang-peng(朱益民,孔祥鹏). High Voltage Engineering(高压电技术),2006, 32(1): 57. [5] Haugsjaa P O, Amme R C. J. Chem. Phys., 1970, 52(9): 4874. [6] Finn T G,Doering J P. J. Chem. Phys.,1976,64(11):4490. [7] Itikawa Y,Ichimuru A. J. Phys. Chem. Ref. Data, 1990, 19(3): 637.