Abstract：A strong complex agent is normally used in the alkaline chemical plating solution for Ni-P plating in order to prevent Ni ion from precipitation by hydrolysis. To keep a stable pH condition, an NH3-NH4Cl buffer system is used. Traditionally, it is considered that NH3 does not participate in the complex becaｕse of the relativelｙ low Ni-NH3 compleｘinｇ constant，bｕt some eｘperimental resｕlts cannot be eｘplained reasonablｙ. Toｕhami etc. have proposed a ternarｙ Ni-citrate-NH3 compleｘ involved in the discharｇe process，however theｙ cannot ｇive the direct sｕpport on the presence of this compleｘ in solｕtion. In this paper, a UV-Vis spectrometric study was carried out to identify the nickel complex in the Ni-P plating solution, and the results indicated the presence of both Ni-cit binary complex and Ni-cit-ammonia ternary complex. After the systematic investigation of the dependence of UV-Vis spectra on the two ligands (cit and ammonia), the composition of this Ni-cit-ammonia ternary complex was supposed to be Ni(Ⅱ)(C6H5O3-7)(NH3)3.
王徐承，蔡文斌，王卫江，柳厚田* . UV-Vis光谱法表征化学镀Ni-P合金镀液中活性配合物组成 [J]. 光谱学与光谱分析, 2004, 24(07): 837-840.
WANG Xu-cheng, CAI Wen-bin, WANG Wei-jiang, LIU Hou-tian* . UV-Vis Spectrometric Characterization of the Composition of Active Complex in the Ni-P Plating Solution . SPECTROSCOPY AND SPECTRAL ANALYSIS, 2004, 24(07): 837-840.
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