Study on Optical Emission Spectroscopy of Pulse Corona Methane Plasma
LI Jin-ping1,2, DAI Bin2*, FAN Ting1
1. Department of Physics, Normal College, Shihezi University, Shihezi 832003, China 2. School of Chemistry and Chemical Engineering, Shihezi University, Shiheizi 832003, China
Abstract：From experiments of methane pulse corona plasma and plasma emission spectrometry, the emission spectra of methane ranging from 370 to 1 100 nm were recorded and marked with CCD (Charge Coupled Device) grating spectrometry. The ionization products of H, C+, CH, C, C2, C3, C4, C5 and hydrocarbon were confirmed through high purity methane (purity 99.99%) ionized by pulse high voltage of 100 kV and 100 Hz under normal temperature and normal pressure. Through analyzing the experimental emission spectrum of methane plasma, the ionization mechanism, i.e. methane gas was ionized into corona plasma by pulse high voltage, was analyzed and the ionization of free radical CHn(n=3, 2, 1), carbon and hydrocarbons was given as well. Research results show that the dehydrogenation achieved a high level when methane molecules collide inelastically with high energy electrons, and the hydrogen atoms, hydrogen ions and methane free radicals were synthesized into alkenes, alkynes, alkanes and high polymer of carbon with further inelastic collision of high energy electrons. This experimental spectrum and mechanism analysis can be applied to the research on methane conversion.
李金平1，2,代斌2*,范婷1 . 甲烷电离特性的等离子体发射光谱法研究[J]. 光谱学与光谱分析, 2009, 29(07): 1979-1982.
LI Jin-ping1,2, DAI Bin2*, FAN Ting1 . Study on Optical Emission Spectroscopy of Pulse Corona Methane Plasma . SPECTROSCOPY AND SPECTRAL ANALYSIS, 2009, 29(07): 1979-1982.
[1] Kalnicky Dennis J, Kniseley Richard N, Fassel Velmer A. Spectrochimica Acta Part B: Atomic Spectroscopy, 1975, 30(12): 511. [2] Hayakawa T, Kikui F, Ikeda S. Spectrochimica Acta Part B: Atomic Spectroscopy, 1982, 37(12): 1069. [3] Hettipathirana T D, Wade A P, Blades M W. Spectrochimica Acta Part B: Atomic Spectroscopy, 1990, 45(3): 271. [4] Tsuji Kouichi, Hirokawa Kichinosuke. Applied Surface Science, 1992, 59(1): 31. [5] Barholm-Hansena C, Bentzona M D, Hansena J B. Diamond and Related Materials, 1994, 3(4-6): 564. [6] WEI Hai-jun, GUAN De-lin, SUN Pei-ting, et al(魏海军, 关德林, 孙培廷，等). Spectroscopy and Spectral Analysis(光谱学与光谱分析), 2006, 26(2): 340. [7] TANG Xiao-liang, FENG Xian-ping, LI Zhi-guang, et al(唐晓亮, 冯贤平, 黎志光，等). Spectroscopy and Spectral Analysis(光谱学与光谱分析), 2004, 24(11): 1437. [8] ZHANG Xiu-ling, LIU Zhong-fan, LI Xue-hui(张秀玲，刘中凡，李学慧). Chinese Journal of Light Scattering(光散射学报), 2004, 16(2): 166. [9] Rie K T, Menthe E, Wohle J. Surface and Coatings Technology, 1998, 98: 1192. [10] Vandevelde T, Nesladek M, Quaeyhaegens C, et al. Thin Solid Films, 1996, 290-291: 143. [11] Barshilia H C, Vankar V D. J. Appl. Phys., 1996, 80(7): 3694. [12] HUANG Song, XIN Yu, NING Zhao-yuan. Plasma Science ＆ Technology, 2005, 7(1): 2669. [13] Herzberg G. The Spectra and Structures of Simple Free Radicals—An Introduction to Molecular Spectroscopy. New York: Dover Publications, 1988. 204. [14] The National Instituue of Standards and Technology(NIST). http://www.nist.gov. [15] Basic Science Date Center(中国理化数据库原子分子物理数据库). http://www.nsdc.cn/codata/index.jsp.
